OPTICAL FAULT LOCALIZATION SYSTEM

SEMICAPS PEM


SEMICAPS Photon Emission Microscope (PEM) is a failure analysis technique for localization of defects in semiconductor
devices. Capable of quickly locating leaky junctions, contact spiking (due to ESD), latch-up, oxide breakdown, and other current leakage phenomena that produce light emissions.

System sensitivity plays a pivotal role in photon emission and is imperative for detection of the faint emissions.
SEMICAPS recognizes this important and essential requirement and we offer a high performance, highly sensitive system,
that is unmatched when it comes to sensitivity.

CRITICAL DESIGN CONSIDERATIONS

Optics
SEMICAPS designs to optimize and enhance the system for maximum photon throughput to the detector.

High Numerical Aperture & Long Working Distance Objectives Lens
The NA of the objective lens is critical. Higher NA lens yield better light collecting efficiency. Long working distance lens have better depth of focus and allows microprobing of devices

High Sensitivity Macro Lens
To provide a global view of the entire device, SEMICAPS offers 1x macro lens with a high NA of 0.4.

Optimized Tube Lens Design
For maximum light throughput, SEMICAPS PEM uses large diameter tube lens to minimize light loss and prevents vignetting, thus improving sensitivity.



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